Japanese company Fujifilm has announced plans to set up a new semiconductor materials manufacturing facility in India with an investment of around Rs 800 crore (USD 83 million).
The greenfield facility will be developed in two phases, with investments starting from October 2026. Commercial production is expected to begin in fiscal year 2028, the company said.
Investment to be made in two phases
According to Fujifilm, the project will follow a staggered investment plan based on the growth of the semiconductor industry and customer demand.
The first phase will focus on manufacturing front-end process chemicals, which are used during semiconductor production.
The second phase will cover semiconductor surface conditioning materials and high-purity chemicals. The company said the timing and scale of this phase will depend on how the semiconductor industry develops in the coming years.
Fujifilm backs India’s semiconductor push
Fujifilm said the project will support the objectives of the India Semiconductor Mission and contribute to the country’s growing semiconductor manufacturing ecosystem.
The company also plans to work with the government’s semiconductor programme and seek support under the ISM 2.0 policy, which was approved by the Government of India in July 2026.
Commercial production expected in 2028
The new facility will be developed as a greenfield manufacturing project, with the investment being rolled out from October 2026.
Fujifilm expects the plant to begin commercial production in FY2028, as India continues to expand its semiconductor manufacturing and materials ecosystem.
