Hyderabad will soon host India’s first dedicated hub for chemical mechanical polishing (CMP) pad technologies, following a partnership between Telangana government-supported prototyping centre T-Works and Japanese firm Toho Koki Seisakusho Co.
The facility, valued at ₹8 crore, will be housed at T-Works and designed as an open-access space for learning, demonstration, and collaboration. According to Industries and IT Minister D. Sridhar Babu, the hub will provide students, researchers, startups, and global enterprises an opportunity to access world-class CMP technologies for the first time in India.
The Minister’s office described the initiative as a gateway for Japanese expertise to enter India while giving Indian companies and researchers access to the global semiconductor supply chain. Telangana sees this collaboration as part of its broader push to create international linkages for India’s semiconductor mission.
A central feature of the partnership will be the installation of Toho Koki’s CMP groove processing machine, the first of its kind in India. The facility is expected to enable joint research with IITs and small and medium enterprises, with the goal of indigenising CMP pad manufacturing within 18 to 24 months.
T-Works also plans to host workshops and industry–academia dialogues around the new hub, encouraging innovation and knowledge exchange. Outbound visits by Indian SMEs and officials to Japan’s Mie Semiconductor Network are also under consideration.
The CMP hub is positioned to become a centre of excellence at T-Works, with the potential to attract Japanese corporates and startups into India’s expanding semiconductor ecosystem.
Global Business Head of Toho Koki Takuya Nishimura said the collaboration is aimed at strengthening India’s capabilities in CMP pad technology, a critical part of semiconductor manufacturing. T-Works CEO Joginder Tanikella was also present at the signing of the memorandum of understanding.
